Concepedia

Ben Eynon

BE

2

Publications

36

Citations

2

H-Index

2008

Active since

Affiliations

Samsung (South Korea)(Current)

Ben Eynon is an author at Samsung (South Korea) specializing in magnetic resonance, optical properties, and physics.

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Publications per year

2008–2008

2

Publications

2

32 nm imprint masks using variable shape beam pattern generators

Kosta Selinidis, Ecron Thompson, Gerard M. Schmid et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 25 citations

Full-field imprinting of sub-40 nm patterns

Jeongho Yeo, Hoyeon Kim, Ben Eynon · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 11 citations

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