R.J. Koval - Concepedia

Author

R.J. Koval

Also Known As

Koval, R, J, Koval, R. J., Koval, Randy, J, R J Koval, R. J. Koval, R. Koval, R.J Koval, R.J. Koval, R.Yu. KOVAL, Randy J. Koval

Publications

1.1K

Citations

H-Index

Concepts

All Affiliations

Pennsylvania State University Micron (United States)Intel (United States)

About

R.J. Koval is an author at Pennsylvania State University specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	17	22	979
2	Applied Physics	16	21	931
3	Electrical Engineering	10	10	302
4	Chemistry	1	1	11
5	Computer Engineering	1	1	48

R.J. Koval

Publications

999

Citations

H-Index

Page 1

	Year	Citations
Evolution of microstructure and phase in amorphous, protocrystalline, and microcrystalline silicon studied by real time spectroscopic ellipsometry R. W. Collins, André S. Ferlauto, G.M. Ferreira, Solar Energy Materials and Solar Cells Materials ScienceEngineeringApplied PhysicsSiliceneSemiconductor Device Fabrication	2003	326
Light Induced Defect Creation Kinetics in Thin Film Protocrystalline Silicon Materials and Their Solar Cells C. R. Wronski, Joshua M. Pearce, R.J. Koval, MRS Proceedings Materials ScienceEngineeringApplied PhysicsTheir Solar CellsDefect Formation	2002	61
Performance and stability of Si:H p–i–n solar cells with <i>i</i> layers prepared at the thickness-dependent amorphous-to-microcrystalline phase boundary R.J. Koval, Joohyun Koh, Zhou Lu, Applied Physics Letters EngineeringThin Film Process TechnologyPhotovoltaicsSemiconductor NanostructuresSemiconductors	1999	56
Dependence of open-circuit voltage in hydrogenated protocrystalline silicon solar cells on carrier recombination in <i>p/i</i> interface and bulk regions Joshua M. Pearce, R.J. Koval, André S. Ferlauto, Applied Physics Letters Semiconductor TechnologyElectrical EngineeringOpen-circuit VoltageEngineeringSemiconductor Device	2000	54
Extended phase diagrams for guiding plasma-enhanced chemical vapor deposition of silicon thin films for photovoltaics applications André S. Ferlauto, R.J. Koval, C. R. Wroński, Applied Physics Letters EngineeringH Intrinsic LayersChemical DepositionSilicon On InsulatorPlasma Processing	2002	51
3DNAND GIDL-Assisted Body Biasing for Erase Enabling CMOS under Array (CUA) Architecture C. Caillat, K.L. Beaman, Andrew Bicksler, Hardware SecurityNon-volatile MemoryElectrical EngineeringPhysical Design (Electronics)Engineering	2017	48
Real time analysis of amorphous and microcrystalline silicon film growth by multichannel ellipsometry R. W. Collins, Joohyun Koh, André S. Ferlauto, Thin Solid Films Materials ScienceReal Time AnalysisEngineeringMicrofabricationSilicon On Insulator	2000	45
Maximization of the open circuit voltage for hydrogenated amorphous silicon n–i–p solar cells by incorporation of protocrystalline silicon <i>p</i>-type layers R.J. Koval, Chi Chen, G.M. Ferreira, Applied Physics Letters EngineeringSolar Cell VocPhotovoltaic DevicesPhotovoltaicsSemiconductor Device	2002	45
Real time spectroscopic ellipsometry studies of the nucleation and growth of <i>p</i>-type microcrystalline silicon films on amorphous silicon using B2H6, B(CH3)3 and BF3 dopant source gases Joohyun Koh, Hiroyuki Fujiwara, R.J. Koval, Journal of Applied Physics Dopant SourceEngineeringRadio FrequencyThin Film Process TechnologySilicon On Insulator	1999	41
Evaluation of compositional depth profiles in mixed-phase (amorphous+crystalline) silicon films from real time spectroscopic ellipsometry André S. Ferlauto, G.M. Ferreira, R.J. Koval, Thin Solid Films Materials ScienceMaterials EngineeringCompositional Depth ProfilesEngineeringOptical Properties	2004	31

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