Corinne Duluard

<i>In situ</i> x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O2 cryoetching process

J. Péreira, Laurianne Pichon, Rémi Dussart et al. · Applied Physics Letters · 2009 · 82 citations

Natural Sciences, Materials Engineering, Materials Science +17

Progresses on the Use of Two-Photon Absorption Laser Induced Fluorescence (TALIF) Diagnostics for Measuring Absolute Atomic Densities in Plasmas and Flames

Kristaq Gazeli, G. Lombardi, X Aubert et al. · Plasma · 2021 · 37 citations · Full text

Natural Sciences, Materials Science, Physics +17

PTFE Surface Etching in the Post‐discharge of a Scanning RF Plasma Torch: Evidence of Ejected Fluorinated Species

Thierry Dufour, Julie Hubert, Pascal Viville et al. · Plasma Processes and Polymers · 2012 · 31 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Plasma diagnostics of an Ar/NH3 direct-current reactive magnetron sputtering discharge for SiNx deposition

Franck Henry, Corinne Duluard, Abdelkrim Batan et al. · Thin Solid Films · 2012 · 20 citations

Natural Sciences, Materials Engineering, Materials Science +15

SO₂passivating chemistry for silicon cryogenic deep etching

Corinne Duluard, Rémi Dussart, Thomas Tillocher et al. · Plasma Sources Science and Technology · 2008 · 13 citations

Natural Sciences, Materials Engineering, Materials Science +17