C. H. Lee

Ge MOSFETs performance: Impact of Ge interface passivation

C. H. Lee, Tomonori Nishimura, Toshiyuki Tabata et al. · 2010 · 83 citations

Electrical Engineering, Engineering, Physics +7

Record-high electron mobility in Ge n-MOSFETs exceeding Si universality

C. H. Lee, Tomonori Nishimura, N. Saido et al. · 2009 · 78 citations

Device Modeling, Semiconductor Technology, Electrical Engineering +9

Material potential and scalability challenges of germanium CMOS

Akira Toriumi, C. H. Lee, Shengkai Wang et al. · 2011 · 56 citations

Semiconductor Technology, Present Status, Electrical Engineering +12

Oxygen potential engineering of interfacial layer for deep sub-nm EOT high-k gate stacks on Ge

C. H. Lee, Cimang Lu, Toshiyuki Tabata et al. · 2013 · 34 citations

Engineering, Vlsi Design, Superior Interface Properties +18

Preparation and Photocatalytic Activity of Potassium- Incorporated Titanium Oxide Nanostructures Produced by the Wet Corrosion Process Using Various Titanium Alloys

C. H. Lee, Do Yun Kim, Jean‐Pierre Locquet et al. · Nanomaterials · 2015 · 25 citations · Full text