Kunimasa Takahashi - Concepedia

Author

Kunimasa Takahashi

Nagoya University

Also Known As

K. TAKAHASHI, K. Takahashi, KUNIMASA TAKAHASHI, Kunimasa TAKAHASHI, Kunimasa Takahashi

Publications

869

Citations

H-Index

Concepts

All Affiliations

Nagoya University Panasonic (Japan)California Institute of Technology Renesas Electronics (Japan)

About

Kunimasa Takahashi is an author at Nagoya University specializing in engineering, chemistry, and natural sciences.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	13	17	622
2	Chemistry	9	9	444
3	Natural Sciences	8	8	404
4	Applied Physics	7	7	293
5	Chemical Engineering	2	2	77

Kunimasa Takahashi

Publications

736

Citations

H-Index

Page 1

	Year	Citations
Effects of reactant and product adsorption in normal pulse polarography James B. Flanagan, Kunimasa Takahashi, Fred C. Anson Journal of Electroanalytical Chemistry Polarization ImagingProduct AdsorptionUltrasound	1977	114
Some virtues of differential pulse polarography in examining adsorbed reactants Fred C. Anson, James B. Flanagan, Kunimasa Takahashi, Journal of Electroanalytical Chemistry EngineeringPhysicsNatural SciencesSpectroscopyPhysical Chemistry	1976	73
Fluorocarbon radicals and surface reactions in fluorocarbon high density etching plasma. II. H2 addition to electron cyclotron resonance plasma employing CHF3 Kunimasa Takahashi, Masaru Hori, Toshio Goto Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringPlasma PhysicsChemistryPlasma ProcessingPlasma Theory	1996	71
Novel SiC power MOSFET with integrated unipolar internal inverse MOS-channel diode Masao Uchida, Nobuyuki Horikawa, Kenichiro Tanaka, Electrical EngineeringInternal DiodeEngineeringPower DeviceNanoelectronics	2011	60
Characteristics of Fluorocarbon Radicals and CHF<sub>3</sub>Molecule in CHF<sub>3</sub>Electron Cyclotron Resonance Downstream Plasma Kunimasa Takahashi, Masaru Hori, Toshio Goto Japanese Journal of Applied Physics Radical EmissionEngineeringPlasma SciencePlasma PhysicsChemistry	1994	55
Fluorocarbon radicals and surface reactions in fluorocarbon high density etching plasma. I. O2 addition to electron cyclotron resonance plasma employing CHF3 Kunimasa Takahashi, Masaru Hori, Toshio Goto Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringPlasma PhysicsChemistryCf2 Radical DensitiesPlasma Electronics	1996	49
Control of Fluorocarbon Radicals by On-Off Modulated Electron Cyclotron Resonance Plasma Kunimasa Takahashi, Masaru Hori, Toshio Goto Japanese Journal of Applied Physics Radical EmissionEngineeringLaser Plasma PhysicAbsorption SpectroscopyChemistry	1993	45
A high performance video head with Co based alloy laminated films Kunimasa Takahashi, K. Ihara, S. Muraoka, IEEE Transactions on Magnetics Materials ScienceMaterials EngineeringConbtazr AlloyEngineeringMicrostructure	1987	42
Evaluation of CF<sub>2</sub> Radical as a Precursor for Fluorocarbon Film Formation in Highly Selective SiO<sub>2</sub> Etching Process Using Radical Injection Technique Kunimasa Takahashi, Masaru Hori, Muneto Inayoshi, Japanese Journal of Applied Physics Materials ScienceChemical EngineeringEngineeringNanoelectronicsSurface Science	1996	40
Measurements of the CF, CF<sub>2</sub> and CF<sub>3</sub> Radicals in a CHF<sub>3</sub> Electron Cyclotron Resonance Plasma Kunimasa Takahashi, Masaru Hori, Koji Maruyama, Japanese Journal of Applied Physics Microwave SpectroscopyEngineeringPhysicsNatural SciencesSpectroscopy	1993	37

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