Louis C. Frees

Miniature quadrupole residual gas analyzer for process monitoring at milliTorr pressures

David H. Holkeboer, T. L. Karandy, F. C. Currier et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 50 citations

Engineering, Measurement, Gas Sensor +16

Threshold and Cross Section of the Reaction of C+ with Molecular Hydrogen

Ellen Lindemann, Louis C. Frees, R. W. Rozett et al. · The Journal of Chemical Physics · 1972 · 44 citations

Cross Section, Engineering, Physics +12

Mass spectrometric measurements on inductively coupled fluorocarbon plasmas: Positive ions, radicals and endpoint detection

Xi Li, M. Schaepkens, G. S. Oehrlein et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 40 citations

Engineering, Atomic Emission Spectroscopy, Biological Mass Spectrometry +23

Surface etching mechanism of silicon nitride in fluorine and nitric oxide containing plasmas

B. E. E. Kastenmeier, P. J. Matsuo, G. S. Oehrlein et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 37 citations

Materials Science, Chemical Engineering, Engineering +15

Positive ions in spark breakdown of SF₆

Louis C. Frees, I. Sauers, H. W. Ellis et al. · Journal of Physics D Applied Physics · 1981 · 35 citations

Engineering, Spark Breakdown, Plasma Physics +16