Concepedia

Tomomi Ishimaru

TI

Statistics

Publications

4

Citations

84

H-Index

4

Active since

2001

Affiliations

National Institute of Advanced Industrial Science and Technology(Current)

Semiconductor Energy Laboratory (Japan)

Canon (Japan)

Tomomi Ishimaru is an author at National Institute of Advanced Industrial Science and Technology specializing in engineering, applied physics, and thin films.

Top concepts

Publications per year

2001–2003

4

Publications

4

Pore Characteristics of Low-Dielectric-Constant Films Grown by Plasma-Enhanced Chemical Vapor Deposition Studied by Positron Annihilation Lifetime Spectroscopy

Ryoichi Suzuki, Toshiyuki Ohdaira, Yoshimi Shioya et al. · Japanese Journal of Applied Physics · 2001 · 30 citations

, , +12

Properties of Low-k Copper Barrier SiOCH Film Deposited by PECVD Using Hexamethyldisiloxane and N[sub 2]O

Tomomi Ishimaru, Yoshimi Shioya, Hiroshi Ikakura et al. · Journal of The Electrochemical Society · 2003 · 28 citations

, , +14

Positron and positronium annihilation in silica-based thin films studied by a pulsed positron beam

Ryoichi Suzuki, Toshiyuki Ohdaira, Yoshinori Kobayashi et al. · Radiation Physics and Chemistry · 2003 · 13 citations

, , +7

Copper Barrier Properties of Low Dielectric Constant SiOCNH Film Deposited by Plasma-Enhanced CVD

Yoshimi Shioya, Tomomi Ishimaru, Hiroshi Ikakura et al. · Journal of The Electrochemical Society · 2003 · 13 citations

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