Concepedia

Yoshimi Shioya

YS

15

Publications

383

Citations

13

H-Index

1985

Active since

Affiliations

Fujitsu (Japan)(Current)

National Institute of Advanced Industrial Science and Technology

Semiconductor Energy Laboratory (Japan)

Yoshimi Shioya is an author at Fujitsu (Japan) specializing in surface science, applied physics, and thin films.

Top concepts

EngineeringApplied PhysicsSurface ScienceThin FilmsMaterial ScienceMaterials EngineeringCrystalline DefectsMicroelectronicsChemistryMicrostructure

Publications per year

1985–2008

15

Publications

15

Effect of fluorine in chemical-vapor-deposited tungsten silicide film on electrical breakdown of SiO2 film

Yoshimi Shioya, Seiichiro Kawamura, Ikuro Kobayashi et al. · Journal of Applied Physics · 1987 · 69 citations

Materials Engineering, Sio2 Film, Chemical Engineering +14

Analysis of the effects of annealing on resistivity of chemical vapor deposition tungsten–silicide films

Yoshimi Shioya, Mamoru Maeda · Journal of Applied Physics · 1986 · 45 citations

Materials Science, Materials Engineering, Semiconductors +13

Analysis of stress in chemical vapor deposition tungsten silicide film

Yoshimi Shioya, Takahiro Itoh, Shinichi Inoue et al. · Journal of Applied Physics · 1985 · 36 citations

Materials Engineering, Materials Science, Engineering +14

Comparison of Phosphosilicate Glass Films Deposited by Three Different Chemical Vapor Deposition Methods

Yoshimi Shioya, Mamoru Maeda · Journal of The Electrochemical Society · 1986 · 30 citations

Optical Materials, Engineering, Optical Glass +17

Pore Characteristics of Low-Dielectric-Constant Films Grown by Plasma-Enhanced Chemical Vapor Deposition Studied by Positron Annihilation Lifetime Spectroscopy

Ryoichi Suzuki, Toshiyuki Ohdaira, Yoshimi Shioya et al. · Japanese Journal of Applied Physics · 2001 · 30 citations

Materials Science, Pick-off Annihilation, Engineering +12

Rows per page

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