Concepedia

Ikuro Kobayashi

IK

3

Publications

96

Citations

3

H-Index

1986

Active since

Affiliations

Fujitsu (Japan)(Current)

Ikuro Kobayashi is an author at Fujitsu (Japan) specializing in materials engineering, engineering, and applied physics.

Top concepts

Thin FilmsEngineeringApplied PhysicsSurface ScienceMaterials EngineeringMaterial ScienceMicroelectronicsCrystalline DefectsChemical EngineeringElectrical Engineering

Publications per year

1986–1987

3

Publications

3

Effect of fluorine in chemical-vapor-deposited tungsten silicide film on electrical breakdown of SiO2 film

Yoshimi Shioya, Seiichiro Kawamura, Ikuro Kobayashi et al. · Journal of Applied Physics · 1987 · 69 citations

Materials Engineering, Sio2 Film, Chemical Engineering +14

Changes in Resistivity and Composition of Chemical Vapor Deposited Tungsten Silicide Films by Annealing

Yoshimi Shioya, Takahiro Itoh, Ikuro Kobayashi et al. · Journal of The Electrochemical Society · 1986 · 15 citations

Engineering, Excess Si, Thin Film Process Technology +17

Properties of Chemical Vapor Deposited Tungsten Silicide Films Using Reaction of WF 6 and Si2 H 6

Yoshimi Shioya, Kaoru Ikegami, Ikuro Kobayashi et al. · Journal of The Electrochemical Society · 1987 · 12 citations

Crystal Structure, Engineering, Thin Film Process Technology +18

Rows per page

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