Concepedia
Statistics
Publications
13
Citations
501
H-Index
Active since
2002
Affiliations
The University of Osaka(Current)
Osaka Research Institute of Industrial Science and Technology
Japan Science and Technology Agency
Panasonic (Japan)
Asuha is an author at The University of Osaka specializing in materials engineering, materials science, and silicon materials.
Publications per year
2002–2010
Ultrathin silicon dioxide layers with a low leakage current density formed by chemical oxidation of Si
Asuha, Takuya Kobayashi, Osamu Maida et al. · Applied Physics Letters · 2002 · 104 citations
Engineering, Materials Engineering, Materials Science +16
Formation of 10–30nm SiO2/Si structure with a uniform thickness at ∼120°C by nitric acid oxidation method
Asuha, Sung-Soon Im, Masato Tanaka et al. · Surface Science · 2006 · 49 citations
Natural Sciences, Materials Engineering, Materials Science +15
Nitric acid oxidation of silicon at ∼120°C to form 3.5-nm SiO2∕Si structure with good electrical characteristics
Asuha, Shigeki Imai, Masao Takahashi et al. · Applied Physics Letters · 2004 · 49 citations
Engineering, Materials Engineering, Materials Science +17
Nitric acid oxidation of Si (NAOS) method for low temperature fabrication of SiO2/Si and SiO2/SiC structures
H. Kobayashi, Kentaro Imamura, W.-B. Kim et al. · Applied Surface Science · 2010 · 46 citations
Natural Sciences, Materials Engineering, Materials Science +13
Spectroscopic and electrical properties of ultrathin SiO2 layers formed with nitric acid
Asuha, Takuya Kobayashi, Masao Takahashi et al. · Surface Science · 2003 · 42 citations
Natural Sciences, Materials Engineering, Materials Science +11
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