Sean Kang

Atomic layer etching of Al2O3 using BCl3/Ar for the interface passivation layer of III–V MOS devices

K.S. Min, Sean Kang, J.K. Kim et al. · Microelectronic Engineering · 2013 · 39 citations

Engineering, Materials Engineering, Materials Science +16

Low interface trap density in scaled bilayer gate oxides on 2D materials via nanofog low temperature atomic layer deposition

Iljo Kwak, Mahmut S. Kavrik, Jun Hong Park et al. · Applied Surface Science · 2018 · 38 citations

Engineering, Materials Engineering, Materials Science +14

Atomic layer etching of BeO using BCl3/Ar for the interface passivation layer of III–V MOS devices

K.S. Min, Sean Kang, J.K. Kim et al. · Microelectronic Engineering · 2013 · 16 citations

Engineering, Materials Engineering, Materials Science +16