Concepedia
Statistics
Publications
39
Citations
1.5K
H-Index
21
Active since
1974
Affiliations
Fujitsu (Japan)(Current)
The University of Tokyo
Nagoya University
Hokkaido University
Tokyo Institute of Technology
Hajime Ishikawa is an author at Fujitsu (Japan) specializing in materials science, engineering, and semiconductor devices.
Publications per year
1974–2023
Advantages of thermal nitride and nitroxide gate films in VLSI process
Takashi Ito, T. Nakamura, Hajime Ishikawa · IEEE Transactions on Electron Devices · 1982 · 232 citations
Engineering, Electrical Engineering, Materials Science +17
Direct Thermal Nitridation of Silicon Dioxide Films in Anhydrous Ammonia Gas
Takashi Ito, Takao Nozaki, Hajime Ishikawa · Journal of The Electrochemical Society · 1980 · 110 citations
Engineering, Materials Engineering, Materials Science +17
Emergence of nontrivial magnetic excitations in a spin-liquid state of kagomé volborthite
Daiki Watanabe, Kaori Sugii, Masaaki Shimozawa et al. · Proceedings of the National Academy of Sciences · 2016 · 91 citations · Full text
Natural Sciences, Physics, Condensed Matter Physics +16
One-Third Magnetization Plateau with a Preceding Novel Phase in Volborthite
Hajime Ishikawa, Masahiro Yoshida, Kazuhiro Nawa et al. · Physical Review Letters · 2015 · 89 citations · Full text
Natural Sciences, Materials Science, Physics +17
Possible observation of quantum spin-nematic phase in a frustrated magnet
Yoshimitsu Kohama, Hajime Ishikawa, Akira Matsuo et al. · Proceedings of the National Academy of Sciences · 2019 · 85 citations · Full text
Natural Sciences, Physics, Condensed Matter Physics +12
1–5 of 39