P.J.P.M. Simons

Transient ALD simulations for a multi-wafer reactor with trenched wafers

Adriaan Lankhorst, Bart Paarhuis, Herbert Terhorst et al. · Surface and Coatings Technology · 2007 · 51 citations

Engineering, Computational Engineering, Microelectronics +15

Growth of ZnO :Al by high-throughput CVD at atmospheric pressure

A. Illiberi, P.J.P.M. Simons, B. Kniknie et al. · Journal of Crystal Growth · 2012 · 34 citations

Natural Sciences, Materials Engineering, Materials Science +14

Industrial high-rate (∼14nm/s) deposition of low resistive and transparent ZnOx:Al films on glass

A. Illiberi, B. Kniknie, J. van Deelen et al. · Solar Energy Materials and Solar Cells · 2011 · 32 citations

Natural Sciences, Materials Engineering, Materials Science +17

APCVD of ZnO:Al, insight and control by modeling

J. van Deelen, A. Illiberi, B. Kniknie et al. · Surface and Coatings Technology · 2013 · 16 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +4

Atmospheric pressure chemical vapor deposition of ZnO: Process modeling and experiments

J. van Deelen, A. Illiberi, B. Kniknie et al. · Thin Solid Films · 2013 · 12 citations

Engineering, Materials Engineering, Materials Science +9