E. L. Hall - Concepedia

Author

E. L. Hall

Motorola (United States)

Also Known As

E Hall, E. Hall, E. L. Hall, E.L. Hall, Edward L. Hall

Publications

271

Citations

H-Index

Concepts

All Affiliations

Motorola (United States)General Electric (United States)Northwestern University Argonne National Laboratory

About

E. L. Hall is an author at Motorola (United States) specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	215
2	Applied Physics	6	6	159
3	Electrical Engineering	5	5	95
4	Natural Sciences	3	3	92
5	Chemistry	1	1	28

E. L. Hall

Publications

215

Citations

H-Index

Page 1

	Year	Citations
Magnetic Structure of MnAs and MnAs0·92P0·08 L. H. Schwartz, E. L. Hall, G. P. Felcher Journal of Applied Physics Magnetic PropertiesEngineeringMagnetic ResonanceMagnetic TexturesMagnetic Ordering Temperature	1971	49
Surface Reconstruction of Aluminum Metallization -- a New Potential Wearout Mechanism Elliott Philofsky, K. V. Ravi, E. L. Hall, Reliability physics EngineeringMechanical EngineeringSilicon On InsulatorAnodizingWafer Scale Processing	1971	36
Strain relief of large lattice mismatch heteroepitaxial films on silicon by tilting L. J. Schowalter, E. L. Hall, Nathan S. Lewis, Thin Solid Films Materials ScienceEngineeringDislocation InteractionApplied PhysicsMultilayer Heterostructures	1990	29
Crystal and Magnetic Structure of MnAs0.92P0.08 E. L. Hall, L. H. Schwartz, G. P. Felcher, Journal of Applied Physics X-ray CrystallographyCrystal StructureMagnetic PropertiesNeutron DiffractionEngineering	1970	28
Electron microscopy of epitaxial Si/CaF2/Si structures R. W. Fathauer, N. Lewis, L. J. Schowalter, Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena Materials EngineeringMaterials ScienceElectrical EngineeringEpitaxial GrowthEngineering	1985	20
Electrical Resistance and Magnetic Permeability of Iron Wire at Radio Frequencies G. R. Wait, F. G. Brickwedde, E. L. Hall Physical Review Electrical ResistanceEngineeringRadio FrequenciesMagnetic MaterialsMagnetism	1928	15
Application and simulation of low temperature plasma processes in semiconductor manufacturing Peter L. G. Ventzek, Shahid Rauf, P. Stout, Applied Surface Science EngineeringSemiconductor ManufacturingLow-temperature PlasmasPlasma SimulationApplied Physics	2002	14
Dissolution Rates and Reliability Effects of Au, Ag, Ni and Cu in Lead Base Solders H. Berg, E. L. Hall Reliability physics Relative Dissolution RatesEngineeringDissolution RatesMechanical EngineeringDie-solder Interface	1973	13
Materials characteristics of pseudomorphic high electron mobility transistor structures with InxGa1−xas single quantum well and GaAs-InxGa1−xas (0.25 < x < 0.4) thin strained superlattice active layers J. M. Ballingall, Pin Ho, Paul Martin, Journal of Electronic Materials Materials ScienceSemiconductor TechnologyElectrical EngineeringEngineeringActive Layers	1990	11

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