Daniel J. Carbaugh

Photolithography with polymethyl methacrylate (PMMA)

Daniel J. Carbaugh, Jason T. Wright, Parthiban Rajan et al. · Semiconductor Science and Technology · 2015 · 42 citations

Optical Materials, Engineering, Electron-beam Lithography +20

Thermal oxidation of silicon in a residual oxygen atmosphere—the RESOX process—for self-limiting growth of thin silicon dioxide films

Jason T. Wright, Daniel J. Carbaugh, Morgan E Haggerty et al. · Semiconductor Science and Technology · 2016 · 19 citations

Self-limiting Growth, Growth Procedures, Engineering +16

Combination photo and electron beam lithography with polymethyl methacrylate (PMMA) resist

Daniel J. Carbaugh, Sneha G. Pandya, Jason T. Wright et al. · Nanotechnology · 2017 · 15 citations

Optical Materials, Engineering, Electron-beam Lithography +18

Negative tone photolithography with photo-sensitised polymethyl methacrylate (PMMA)

Daniel J. Carbaugh, Jason T. Wright, Faiz Rahman · Microelectronic Engineering · 2017 · 11 citations

Materials Science, Engineering, Beam Lithography +5

Transparent and visible light-insensitive acrylic photoresist for negative tone optical lithography

Daniel J. Carbaugh, Savaş Kaya, Faiz Rahman · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2016 · 10 citations

Materials Science, Photonics, Short Wavelength Optic +15