Masaya Uematsu

A 0.11 μm CMOS technology with copper and very-low-k interconnects for high-performance system-on-a-chip cores

Y. Takao, Hiroshi Kudo, J. Mitani et al. · 2002 · 15 citations

Engineering, Computer Engineering, Electrical Engineering +17

Fabrication of 0.13-µm Device Patterns by Argon Fluoride Excimer Laser Lithography with Practical Resolution Enhancement Techniques

Tohru Ogawa, Masaya Uematsu, Toshio Onodera et al. · Japanese Journal of Applied Physics · 1997 · 10 citations

Engineering, Electrical Engineering, Manufacturing Engineering +13

<title>Subquarter micron optical lithography with practical superresolution technique</title>

Tohru Ogawa, Masaya Uematsu, Fumikatsu Uesawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 10 citations

Engineering, Manufacturing Engineering, Microfabrication +11