J. M. Rosamilia

Conducting films of C60 and C70 by alkali-metal doping

Robert C. Haddon, A. F. Hebard, Matthew J. Rosseinsky et al. · Nature · 1991 · 1.1K citations

Materials Engineering, Materials Science, Engineering +7

High ε gate dielectrics Gd2O3 and Y2O3 for silicon

J. Kwo, M. Hong, A. R. Kortan et al. · Applied Physics Letters · 2000 · 269 citations

Semiconductors, Materials Science, Electrical Engineering +15

Properties of high κ gate dielectrics Gd2O3 and Y2O3 for Si

J. Kwo, M. Hong, A. R. Kortan et al. · Journal of Applied Physics · 2001 · 262 citations

Engineering, Thin Film Process Technology, Silicon On Insulator +16

Photoelectrochemical behavior of C60 films

B. Miller, J. M. Rosamilia, Gary Dabbagh et al. · Journal of the American Chemical Society · 1991 · 142 citations

Chemical Engineering, Chemical Measurement, Engineering +14

The Vertical Replacement-Gate (VRG) MOSFET: a 50-nm vertical MOSFET with lithography-independent gate length

J. M. Hergenrother, D. Monroe, F. Klemens et al. · 2003 · 91 citations

Lithography-independent Gate Length, Advanced Planar Mosfets, Electrical Engineering +15