Toshihide Ide

Statistics

Publications

Citations

737

H-Index

Active since

1999

Affiliations

National Institute of Advanced Industrial Science and Technology(Current)

Yokohama National University

Meiji University

The University of Tokyo

Tokyo University of Science

Toshihide Ide is an author at National Institute of Advanced Industrial Science and Technology specializing in applied physics, engineering, and optoelectronics.

ORCID

Top concepts

EngineeringApplied PhysicsOptoelectronicsMaterial ScienceElectrical EngineeringPhysicsMaterials EngineeringSurface ScienceNanoelectronicsMicroelectronics

Publications per year

1999–2019

Publications

Various low group velocity effects in photonic crystal line defect waveguides and their demonstration by laser oscillation

Kazuaki Kiyota, Tomofumi Kise, N. Yokouchi et al. · Applied Physics Letters · 2006 · 48 citations

Photonics, Engineering, Two-dimensional Photonic Crystal +12

Realization of Ga-polarity GaN films in radio-frequency plasma-assisted molecular beam epitaxy

Xu‐Qiang Shen, Toshihide Ide, S.H Cho et al. · Journal of Crystal Growth · 2000 · 47 citations

Wide-bandgap Semiconductor, Electrical Engineering, Ga-polarity Gan Films +5

Precise control of epitaxy of graphene by microfabricating SiC substrate

Hirokazu Fukidome, Yusuke Kawai, Felix Fromm et al. · Applied Physics Letters · 2012 · 46 citations

Materials Science, Materials Engineering, Electrical Engineering +15

Room temperature continuous wave lasing in InAs quantum-dot microdisks with air cladding

Toshihide Ide, Toshihiko Baba, Jun Tatebayashi et al. · Optics Express · 2005 · 45 citations · Full text

Inas Quantum-dot Microdisks, Quantum Science, Photonics +13

Improvement of film quality using Si-doping in AlGaN/GaN heterostructure grown by plasma-assisted molecular beam epitaxy

Toshihide Ide, Mitsuaki Shimizu, Xu‐Qiang Shen et al. · Journal of Crystal Growth · 2002 · 37 citations

Materials Engineering, Materials Science, Wide-bandgap Semiconductor +8

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