Jürgen W. Gerlach

Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties

Daniel Hiller, Robert Zierold, Julien Bachmann et al. · Journal of Applied Physics · 2010 · 106 citations · Full text

Engineering, Optoelectronic Devices, Chemistry +19

Electrospray Ion Beam Deposition: Soft-Landing and Fragmentation of Functional Molecules at Solid Surfaces

Stephan Rauschenbach, Ralf Vogelgesang, N. Malinowski et al. · ACS Nano · 2009 · 105 citations · Full text

Crystallization of Ge2Sb2Te5 thin films by nano- and femtosecond single laser pulse irradiation

Xinxing Sun, Martin Ehrhardt, Andriy Lotnyk et al. · Scientific Reports · 2016 · 96 citations · Full text

Texture Development in Titanium Nitride Films Grown by Low-Energy Ion Assisted Deposition

B. Rauschenbach, Jürgen W. Gerlach · Crystal Research and Technology · 2000 · 91 citations

Materials Science, Materials Engineering, Ion Implantation +15

Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths

Lutz Prager, P. Maršík, Luise Wennrich et al. · Microelectronic Engineering · 2008 · 76 citations

Materials Science, Ultraviolet Light, Cvd-derived Low-k Material +8