Katherine E. Violette

Author

North Carolina State University

Also Known As

K. E. Violette, K. Violette, K.E. Violette, Katherine E. Violette, Katherine Violette

Publications

228

Citations

H-Index

Concepts

All Affiliations

North Carolina State University Texas Instruments (United States)

About

Katherine E. Violette is an author at North Carolina State University specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	12	199
2	Applied Physics	10	10	171
3	Chemical Engineering	4	4	77
4	Chemistry	4	4	71
5	Electrical Engineering	3	3	38

Katherine E. Violette

Publications

199

Citations

H-Index

Page 1

	Year	Citations
Growth Kinetics, Silicon Nucleation on Silicon Dioxide, and Selective Epitaxy Using Disilane and Hydrogen in an Ultrahigh Vacuum Rapid Thermal Chemical Vapor Deposition Reactor Katherine E. Violette, Mahesh K. Sanganeria, Mehmet C. Öztürk, Journal of The Electrochemical Society EngineeringIntegrated CircuitsChemistrySilicon On InsulatorGrowth Kinetics	1994	30
Low temperature selective silicon epitaxy by ultra high vacuum rapid thermal chemical vapor deposition using Si2H6, H2 and Cl2 Katherine E. Violette, P. O’Neil, Mehmet C. Öztürk, Applied Physics Letters Materials ScienceMaterials EngineeringChemical EngineeringEpitaxial GrowthEngineering	1996	21
66‐3: <i>Invited Paper:</i> Colloidal Quantum Dot Photodetectors for Large Format NIR, SWIR, and eSWIR Imaging Arrays Christopher W. Gregory, Allan Hilton, Katherine E. Violette, SID Symposium Digest of Technical Papers Quantum PhotonicsOptical MaterialsEngineeringHigh ResolutionColloidal Nanocrystals	2021	19
Boron Incorporation in Epitaxial Silicon Using Si2 H 6 and B 2 H 6 in an Ultrahigh Vacuum Rapid Thermal Chemical Vapor Deposition Reactor Mahesh K. Sanganeria, Katherine E. Violette, Mehmet C. Öztürk, Journal of The Electrochemical Society EngineeringSilicon On InsulatorSemiconductorsBoron NitrideGrowth Rate	1995	18
Extended SWIR high performance and high definition colloidal quantum dot imagers Sean Hinds, Ethan J. D. Klem, Christopher W. Gregory, Photonic SensorShort Wavelength OpticOptical MaterialsEngineeringColloidal Nanocrystals	2020	17
Ultrahigh Vacuum Rapid Thermal Chemical Vapor Deposition of Epitaxial Silicon onto (100) Silicon: I . The Influence of Prebake on (Epitaxy/Substrate) Interfacial Oxygen and Carbon Levels Mahesh K. Sanganeria, Mehmet C. Öztürk, Gari Harris, Journal of The Electrochemical Society Materials ScienceEngineeringUltrahigh VacuumEpitaxial SiliconInterfacial Oxygen	1995	15
Low temperature silicon epitaxy in an ultrahigh vacuum rapid thermal chemical vapor deposition reactor using disilane Mahesh K. Sanganeria, Katherine E. Violette, Mehmet C. Öztürk Applied Physics Letters Materials EngineeringMaterials ScienceSemiconductorsEpitaxial GrowthEngineering	1993	15
Low resistance Ti or Co salicided raised source/drain transistors for sub-0.13 μm CMOS technologies C.P. Chao, Katherine E. Violette, S. Unnikrishnan, Low-power ElectronicsElectrical EngineeringEngineeringSource/drain TransistorsNanoelectronics	2002	15
Low thermal budget <i>in</i> <i>situ</i> removal of oxygen and carbon on silicon for silicon epitaxy in an ultrahigh vacuum rapid thermal chemical vapor deposition reactor Mahesh K. Sanganeria, Mehmet C. Öztürk, Katherine E. Violette, Applied Physics Letters Materials EngineeringChemical EngineeringSitu CleanEngineeringNanoelectronics	1995	13
A highly manufacturable 0.25μm RF technology utilizing a unique SiGe integration F.S. Johnson, J. Ai, S. Thomas Dunn, EngineeringManufacturable 0.25μMRf TechnologyElectromagnetic CompatibilityRf Semiconductor	2002	13

Page 1