Concepedia
Statistics
Publications
5
Citations
339
H-Index
Active since
1990
Affiliations
Northwestern University(Current)
Motorola (United States)
W. A. Feil is an author at Northwestern University specializing in materials science, natural sciences, and thin films.
Publications per year
1990–1994
Furnace formation of silicon oxynitride thin dielectrics in nitrous oxide (N2O): The role of nitric oxide (NO)
Philip J. Tobin, Yoshio Okada, Sergio A. Ajuria et al. · Journal of Applied Physics · 1994 · 128 citations
Natural Sciences, Materials Engineering, Materials Science +14
Relationship between growth conditions, nitrogen profile, and charge to breakdown of gate oxynitrides grown from pure N2O
Yoshio Okada, Philip J. Tobin, Vikas Lakhotia et al. · Applied Physics Letters · 1993 · 84 citations
Natural Sciences, Electrical Engineering, Materials Science +11
Organometallic chemical vapor deposition of strontium titanate
W. A. Feil, Bruce W. Wessels, Lauren M. Tonge et al. · Journal of Applied Physics · 1990 · 62 citations
Natural Sciences, Materials Engineering, Materials Science +15
Growth studies of ferroelectric oxide layers prepared by organometallic chemical vapor deposition
L. A. Wills, W. A. Feil, Bruce W. Wessels et al. · Journal of Crystal Growth · 1991 · 50 citations
Natural Sciences, Materials Engineering, Materials Science +16
Defect structure of strontium titanate thin films
W. A. Feil, Bruce W. Wessels · Journal of Applied Physics · 1993 · 15 citations
Natural Sciences, Materials Science, Physics +17
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