B. C. Nguyen

Dielectric Constant and Stability of Fluorine‐Doped Plasma Enhanced Chemical Vapor Deposited SiO2 Thin Films

Peter W. Lee, Shinsuke Mizuno, Amrita Verma et al. · Journal of The Electrochemical Society · 1996 · 36 citations

Materials Science, Electrical Engineering, Electronic Devices +11

Moisture Resistance of Plasma Enhanced Chemical Vapor Deposited Oxides Used for Ultralarge Scale Integrated Device Applications

Stuardo Robles, Ellie Yieh, B. C. Nguyen · Journal of The Electrochemical Society · 1995 · 33 citations

Engineering, Thin Film Process Technology, Vacuum Device +16

Surface Related Phenomena in Integrated PECVD/Ozone‐TEOS SACVD Processes for Sub‐Half Micron Gap Fill: Electrostatic Effects

Kurt kwok, Ellie Yieh, Stuardo Robles et al. · Journal of The Electrochemical Society · 1994 · 25 citations

Engineering, Thin Film Process Technology, Chemical Deposition +17

Electrodeposition of metallic multilayers with modulated electric regimes

N. Lebbad, J. Voiron, B. C. Nguyen et al. · Thin Solid Films · 1996 · 16 citations

Metallic Multilayers, Electrical Engineering, Engineering +4

Improved gap-filling capability of fluorine-doped PECVD silicon oxide thin films

Shinsuke Mizuno, Amrita Verma, Peter Lee et al. · Thin Solid Films · 1996 · 13 citations

Materials Science, Materials Engineering, Engineering +6