C. B. Zarowin

Plasma Etch Anisotropy—Theory and Some Verifying Experiments Relating Ion Transport, Ion Energy, and Etch Profiles

C. B. Zarowin · Journal of The Electrochemical Society · 1983 · 69 citations

Engineering, Plasma Etch Anisotropy, Plasma Science +21

Relation between the RF discharge parameters and plasma etch rates, selectivity, and anisotropy

C. B. Zarowin · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1984 · 61 citations

Engineering, Glow Discharge, Rf Discharge Parameters +19

Control of Plasma Etch Profiles with Plasma Sheath Electric Field and RF Power Density

C. B. Zarowin, R. S. Horwath · Journal of The Electrochemical Society · 1982 · 25 citations

Engineering, Plasma Science, Plasma Physics +18

Plasma thinned SOI bonded wafers

P. B. Mumola, George J. Gardopee, P.J. Clapis et al. · 2005 · 23 citations

Materials Science, Engineering, Applied Physics +3

Rapid, noncontact optical figuring of aspheric surfaces with plasma-assisted chemical etching

L. D. Bollinger, Gregg M. Gallatin, J. Samuels et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1990 · 22 citations

Optical Materials, Engineering, Microscopy +21