Gwon-Woo Choi

Chemical mechanical polishing (CMP) mechanisms of thermal SiO2 film after high-temperature pad conditioning

Nam‐Hoon Kim, Pil-Ju Ko, Gwon-Woo Choi et al. · Thin Solid Films · 2005 · 24 citations

Materials Science, Materials Engineering, Chemical Engineering +9

CMP characteristics and optical property of ITO thin film by using silica slurry with a variety of process parameters

Gwon-Woo Choi, Kang-Yeon Lee, Nam‐Hoon Kim et al. · Microelectronic Engineering · 2006 · 19 citations

Materials Science, Optical Materials, Engineering +9

Removal characteristics of hillock on SnO2 thin film by chemical mechanical polishing process

Yong‐Jin Seo, Nam‐Hoon Kim, Eui-Goo Chang et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2005 · 17 citations

Materials Science, Materials Engineering, Chemical Engineering +14

Effects of various oxidizers on chemical mechanical polishing performance of nickel for microelectromechanical system applications

Nam‐Hoon Kim, Gwon-Woo Choi, Yong‐Jin Seo et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2006 · 13 citations

Engineering, Mechanical Engineering, Various Oxidizers +17

Surface planarization of ZnO thin film for optoelectronic applications

Woo-Sun Lee, Gwon-Woo Choi, Yong‐Jin Seo · Microelectronics Journal · 2008 · 11 citations