P. Haussalo

Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films

Mikko Ritala, Markku Leskelä, Lauri Niinistö et al. · Chemistry of Materials · 1993 · 294 citations

Engineering, Atomic Layer Epitaxy, Altmetric Attention Score +18

Atomic Layer Epitaxy Growth of TiN Thin Films

Mikko Ritala, Markku Leskelä, Eero Rauhala et al. · Journal of The Electrochemical Society · 1995 · 147 citations

Materials Science, Engineering, Atomic Layer Epitaxy +13

Low temperature deposition of AIN films by an alternate supply of trimethyl aluminum and ammonia

Diana Riihelä, Mikko Ritala, Raija Matero et al. · Chemical Vapor Deposition · 1996 · 72 citations

Aluminium Nitride, Thin Film Physics, Engineering +19

Analysis of AlN thin films by combining TOF-ERDA and NRB techniques

Janne J. Jokinen, P. Haussalo, J. Keinonen et al. · Thin Solid Films · 1996 · 65 citations

Materials Science, Materials Engineering, Aluminium Nitride +9

Hydrogen migration in diamond-like carbon films

E. Vainonen, J. Likonen, T. Ahlgren et al. · Journal of Applied Physics · 1997 · 34 citations

Materials Science, Diamond-like Carbon, H Release +14