Concepedia

H. Nihira

HN

Statistics

Publications

6

Citations

141

H-Index

6

Active since

1978

Affiliations

Toshiba (Japan)(Current)

H. Nihira is an author at Toshiba (Japan) specializing in engineering, microelectronics, and electrical engineering.

Publications per year

1978–1986

6

Publications

6

Mechanisms of chemical vapor deposition of silicon

Jun‐ichi Nishizawa, H. Nihira · Journal of Crystal Growth · 1978 · 55 citations

Engineering, Materials Engineering, Materials Science +12

Limiting factors for programming EPROM of reduced dimensions

M. Wada, S. Mimura, H. Nihira et al. · 1980 · 27 citations

Engineering, Computer Engineering, Electrical Engineering +11

Mechanism of hot electron induced degradation in LDD NMOS-FET

Y. Toyoshima, H. Nihira, Masanori Wada et al. · 1984 · 18 citations

Engineering, Electrical Engineering, Materials Science +17

The effect of substrate materials on holding time degradation in MOS dynamic RAM

Hideto Otsuka, Kikuo Watanabe, Híromichi Nishimura et al. · IEEE Electron Device Letters · 1982 · 17 citations

Engineering, Electrical Engineering, Materials Science +17

A 20MHz 32b pipelined CMOS image processor

A. Kanuma, Makoto Noda, H. Nihira et al. · 1986 · 14 citations

Engineering, Computer Engineering, Electrical Engineering +17

1–5 of 6