Rohan P. Chaukulkar

Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors

Rohan P. Chaukulkar, Sumit Agarwal · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2013 · 40 citations

Engineering, Oxidation Resistance, Chemistry +18

Single-Step Plasma Synthesis of Carbon-Coated Silicon Nanoparticles

Rohan P. Chaukulkar, Koen de Peuter, Paul Stradins et al. · ACS Applied Materials & Interfaces · 2014 · 34 citations

Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using <i>in situ</i> infrared reflection absorption spectroscopy

Rohan P. Chaukulkar, Nick F. W. Thissen, R. Vikrant et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2013 · 13 citations

Engineering, Chemistry, Chemical Deposition +18

Chemical Passivation of Crystalline Si by Al₂O₃ Deposited Using Atomic Layer Deposition: Implications for Solar Cells

Abigail R. Meyer, Rohan P. Chaukulkar, Noémi Leick et al. · ACS Applied Nano Materials · 2021 · 12 citations · Full text

Engineering, Chemistry, Chemical Deposition +19