Statistics
Publications
3
Citations
118
H-Index
3
Active since
2015
Affiliations
Daniel Schlamm is an author at University of Wuppertal specializing in applied physics, engineering, and thin films.
Publications per year
2015–2017
3
3
Lukas Hoffmann, D. Theirich, Daniel Schlamm et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 38 citations
Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
Lukas Hoffmann, D. Theirich, Tim Hasselmann et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2015 · 21 citations
Optical Materials, Engineering, Thin Film Process Technology +17
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