Electrical characteristics of field-effect transistors formed with ordered α-sexithienyl

P. Ostoja, S. Guerri, S. Rossini, +3

Synthetic Metals

Electrical CharacteristicsSemiconductor TechnologyElectrical EngineeringElectronic DevicesEngineering +2

Titanium silicide formation: Effect of oxygen distribution in the metal film

M. Berti, A. V. Drigo, C. M. S. Cohen, +4

Journal of Applied Physics

EngineeringOxidation ResistanceSolid-state ChemistryChemistryChemical Deposition +15

Instability in electrical performance of organic semiconductor devices

P. Ostoja, S. Guerri, M. Impronta, +5

Advanced Materials for Optics and Electronics

Materials ScienceOrganic MaterialElectrical EngineeringElectronic DevicesEngineering +13

The effects of phosphorus precipitation on the open-circuit voltage in N+/P silicon solar cells

P. Ostoja, S. Guerri, P. Negrini, +1

Solar Cells

Electrical EngineeringEngineeringOrganic Solar CellApplied PhysicsPhosphorus Precipitation +5

Ion-implanted, electron-beam annealed TiN films as diffusion barriers for Al on Si shallow junctions

A. Armigliato, M. Finetti, Javier Garrido, +3

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

EngineeringThin Film Process TechnologySemiconductor DeviceTi FilmsIon Implantation +15

Contact resistivity of silicon/silicide structures formed by thin film reactions

M. Finetti, S. Guerri, P. Negrini, +2

Thin Solid Films

Materials ScienceEngineeringPhysicsMicrofabricationSurface Science +8

Process dependence of hole trapping in thin nitrided SiO/sub 2/ films

M. Severi, L. Dori, M. Impronta, +1

IEEE Transactions on Electron Devices

EngineeringThin Film Process TechnologySilicon On InsulatorIon ImplantationNitridation Conditions +15

Spectral behavior of solar cells based on the ‘‘junction near local defect layer’’ design

C. Summonte, M. Biavati, E. Gabilli, +4

Applied Physics Letters

Engineering‘ ‘ JunctionDefect TolerancePhotovoltaicsSemiconductor Device +15

Properties of TiN obtained by N+2 implantation on Ti-coated Si wafers

A. Armigliato, G. Celotti, A. Garulli, +4

Applied Physics Letters

EngineeringThin Film Process TechnologyN+2 ImplantationSilicon On InsulatorPhotovoltaics +21

Characterization of titanium nitride films deposited onto silicon

A. Armigliato, G. Celotti, A. Garulli, +4

Thin Solid Films

Materials ScienceEngineeringApplied PhysicsTitanium Nitride FilmsThin Films +2