Naoki Tsukamoto

<i>In situ</i> analyses on negative ions in the sputtering process to deposit Al-doped ZnO films

Naoki Tsukamoto, Daisuke Watanabe, Motoaki Saito et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2010 · 37 citations

Aluminium Nitride, Engineering, Zinc Oxide +17

Al-doped ZnO (AZO) films deposited by reactive sputtering with unipolar-pulsing and plasma-emission control systems

Kento Hirohata, Yasutaka Nishi, Naoki Tsukamoto et al. · Thin Solid Films · 2009 · 33 citations

Materials Science, Materials Engineering, Electrical Engineering +7

High-rate deposition of Sb-doped SnO2 films by reactive sputtering using the impedance control method

Yu Muto, Nobuto Oka, Naoki Tsukamoto et al. · Thin Solid Films · 2011 · 24 citations

Materials Engineering, Materials Science, Electrical Engineering +11

High rate reactive magnetron sputter deposition of Al-doped ZnO with unipolar pulsing and impedance control system

Yasutaka Nishi, Kento Hirohata, Naoki Tsukamoto et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2010 · 18 citations

Materials Science, Electrical Engineering, Optical Materials +12

In-situ analyses on the reactive sputtering process to deposit Al-doped ZnO films using an Al–Zn alloy target

Naoki Tsukamoto, Nobuto Oka, Yuzo Shigesato · Thin Solid Films · 2011 · 17 citations

Materials Science, Aluminium Nitride, Engineering +7