M. J. J. Theunissen

Etch Channel Formation during Anodic Dissolution of N-Type Silicon in Aqueous Hydrofluoric Acid

M. J. J. Theunissen · Journal of The Electrochemical Society · 1972 · 171 citations

Channel Formation, Chemical Engineering, Electrical Engineering +11

Application of Preferential Electrochemical Etching of Silicon to Semiconductor Device Technology

M. J. J. Theunissen, J.A. Appels, W. H. C. G. Verkuylen · Journal of The Electrochemical Society · 1970 · 41 citations

Engineering, Thin Layer Devices, Preferential Electrochemical Etching +20

Analysis of the soft reverse characteristics of n+p drain diodes

M. J. J. Theunissen, F.J. List · Solid-State Electronics · 1985 · 40 citations

Electrical Engineering, Engineering, Power Device +4

Boride-enhanced diffusion in silicon: Bulk and surface layers

N. E. B. Cowern, M. J. J. Theunissen, F. Roozeboom et al. · Applied Physics Letters · 1999 · 35 citations

Materials Science, Semiconductors, Engineering +12

Impact of silicon substrates on leakage currents

J.W. Slotboom, M. J. J. Theunissen, A. Bock · IEEE Electron Device Letters · 1983 · 35 citations

Semiconductors, Semiconductor Technology, Electrical Engineering +15