Concepedia

Johannes Endres

JE

6

Publications

111

Citations

6

H-Index

2012

Active since

Affiliations

Physikalisch-Technische Bundesanstalt(Current)

Danish National Metrology Institute

EdgeWave (Germany)

Helmholtz-Zentrum Berlin für Materialien und Energie

Johannes Endres is an author at Physikalisch-Technische Bundesanstalt specializing in engineering, applied physics, and microscopy.

Top concepts

MicroscopyEngineeringApplied PhysicsPhysicsMaterial ScienceCalibrationInstrumentationOptical PropertiesPhotonic MetrologyEducation

Publications per year

2012–2017

6

Publications

6

Metrology of nanoscale grating structures by UV scatterometry

M. Wurm, Johannes Endres, Jürgen Probst et al. · Optics Express · 2017 · 39 citations · Full text

Transient Grating, Optical Materials, Engineering +20

Investigations of the influence of common approximations in scatterometry for dimensional nanometrology

Johannes Endres, Alexander C. Diener, M. Wurm et al. · Measurement Science and Technology · 2014 · 23 citations

Engineering, Microscopy, Illumination Spot Size +24

First steps towards a scatterometry reference standard

Bernd Bodermann, Poul‐Erik Hansen, Sven Burger et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 14 citations

Engineering, Measurement, Microscopy +21

Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing

Emil Agócs, Bernd Bodermann, Sven Burger et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 13 citations

Afm Measurements, Engineering, Electron-beam Lithography +25

Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry

Johannes Endres, Nitish Kumar, P. Petrík et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 11 citations

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