Concepedia

K. Eisele

KE

Statistics

Publications

9

Citations

579

H-Index

9

Active since

1958

Affiliations

Fraunhofer Institute for Applied Solid State Physics(Current)

K. Eisele is an author at Fraunhofer Institute for Applied Solid State Physics specializing in engineering, applied physics, and microelectronics.

Top concepts

EngineeringApplied PhysicsOptoelectronicsMicroelectronicsElectrical EngineeringPhotonicsLaser ApplicationsOptoelectronic DevicesMaterial ScienceMicrofabrication

Publications per year

1958–1995

9

Publications

9

1.54-μm electroluminescence of erbium-doped silicon grown by molecular beam epitaxy

H. Ennen, Gernot S. Pomrenke, A. Axmann et al. · Applied Physics Letters · 1985 · 347 citations

Semiconductors, Photonics, Electrical Engineering +15

SF 6, a Preferable Etchant for Plasma Etching Silicon

K. Eisele · Journal of The Electrochemical Society · 1981 · 86 citations

Chemical Engineering, Electrical Engineering, Engineering +12

Balanced transistor amplifiers for precise wideband microwave applications

K. Eisele, Rainer Engelbrecht, Kazuya Kurokawa · 1965 · 47 citations

Microwave Circuits, Electrical Engineering, Engineering +5

Low-bias-current direct modulation up to 33 GHz in InGaAs/GaAs/AlGaAs pseudomorphic MQW ridge-waveguide lasers

J.D. Ralston, S. Weisser, K. Eisele et al. · IEEE Photonics Technology Letters · 1994 · 41 citations

Photonics, Low-bias-current Direct Modulation, Millimeter Wave Technology +15

Chemical analysis of a Cl2/BCl3/IBr3 chemically assisted ion-beam etching process for GaAs and InP laser-mirror fabrication under cryo-pumped ultrahigh vacuum conditions

J. Daleiden, K. Eisele, R. E. Sah et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 13 citations

Engineering, Chemical Analysis, Chemical Composition +18

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