Statistics
Publications
7
Citations
110
H-Index
7
Active since
1997
Affiliations
E.C. Mos is an author at ASML (Netherlands) specializing in engineering, computer engineering, and process control.
Publications per year
1997–2019
7
7
Holistic overlay control for multi-patterning process layers at the 10nm and 7nm nodes
Leon Verstappen, E.C. Mos, Peter Wardenier et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 16 citations
Multi-patterning Lithography, Engineering, Electronic Design Automation +19
K.-H. Chen, Jacky Huang, Wencheng Yang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 11 citations
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