Vanita Agarwal

$\hbox{BCl}_{3}/\hbox{Cl}_{2}$-Based Inductively Coupled Plasma Etching of GaN/AlGaN Using Photoresist Mask

D. S. Rawal, Hitendra K. Malik, Vanita Agarwal et al. · IEEE Transactions on Plasma Science · 2012 · 30 citations

Materials Engineering, Wide-bandgap Semiconductor, Electrical Engineering +11

GaN etch rate and surface roughness evolution in Cl2/Ar based inductively coupled plasma etching

D. S. Rawal, Henika Arora, Vanita Agarwal et al. · Thin Solid Films · 2012 · 19 citations

Electrical Engineering, Engineering, Surface Science +9

Reflective SIFT for improving the detection of copy-move image forgery

Vanita Agarwal, Vanita Mane · 2016 · 15 citations

Machine Vision, Image Analysis, Feature Detection +14

A Power and Static Noise Margin Analysis of different SRAM cells at 180nm Technology

Ranjit Kolhal, Vanita Agarwal · 2019 3rd International conference on Electronics, Communication and Aerospace Technology (ICECA) · 2019 · 14 citations

Low-power Electronics, Non-volatile Memory, Electrical Engineering +13

Delay and Power Analysis of Current and Voltage Sense Amplifiers for SRAM at 180nm Technology

Anjali Surkar, Vanita Agarwal · 2019 3rd International conference on Electronics, Communication and Aerospace Technology (ICECA) · 2019 · 13 citations

Low-power Electronics, Electrical Engineering, Cmos Memories +15