Tien-Yeh Li

Process-Variation Effect, Metal-Gate Work-Function Fluctuation, and Random-Dopant Fluctuation in Emerging CMOS Technologies

Yiming Li, Chih‐Hong Hwang, Tien-Yeh Li et al. · IEEE Transactions on Electron Devices · 2010 · 124 citations

Low-power Electronics, Device Modeling, Electrical Engineering +15

Random-Dopant-Induced Variability in Nano-CMOS Devices and Digital Circuits

Yiming Li, Chih‐Hong Hwang, Tien-Yeh Li · IEEE Transactions on Electron Devices · 2009 · 67 citations

Device Modeling, Electrical Engineering, Random-dopant-induced Variability +11

Discrete-Dopant-Induced Timing Fluctuation and Suppression in Nanoscale CMOS Circuit

Yiming Li, Chih‐Hong Hwang, Tien-Yeh Li · IEEE Transactions on Circuits & Systems II Express Briefs · 2009 · 19 citations

Electrical Engineering, Engineering, Vlsi Design +12

Large-scale atomistic approach to random-dopant-induced characteristic variability in nanoscale CMOS digital and high-frequency integrated circuits

Yiming Li, Chih‐Hong Hwang, Ta‐Ching Yeh et al. · International Conference on Computer Aided Design · 2008 · 14 citations

Engineering, Discrete Dopants, Analog Design +17

Large-scale atomistic approach to random-dopant-induced characteristic variability in nanoscale CMOS digital and high-frequency integrated circuits

Yiming Li, Chih‐Hong Hwang, Ta‐Ching Yeh et al. · 2008 · 14 citations