Concepedia

Randolph H. Burton

RH

12

Publications

534

Citations

12

H-Index

1980

Active since

Affiliations

AT&T (United States)(Current)

Randolph H. Burton is an author at AT&T (United States) specializing in engineering, applied physics, and optoelectronics.

Top concepts

Publications per year

1980–1989

12

Publications

12

Ion dynamics of rf plasmas and plasma sheaths: A time-resolved spectroscopic study

Richard A. Gottscho, Randolph H. Burton, Daniel Flamm et al. · Journal of Applied Physics · 1984 · 101 citations

, , +24

Photoelectrochemical etching of integral lenses on InGaAsP/InP light-emitting diodes

F. W. Ostermayer, Paul A. Kohl, Randolph H. Burton · Applied Physics Letters · 1983 · 70 citations

, , +18

Spatially resolved laser-induced fluorescence and optical emission spectroscopy of carbon tetrachloride glow discharges

Richard A. Gottscho, Glenn P. Davis, Randolph H. Burton · Plasma Chemistry and Plasma Processing · 1983 · 67 citations

, , +9

Carbon tetrachloride plasma etching of GaAs and InP: A kinetic study utilizing nonperturbative optical techniques

Richard A. Gottscho, G. Smolinsky, Randolph H. Burton · Journal of Applied Physics · 1982 · 67 citations

, , +17

Surface composition and etching of III-V semiconductors in Cl2 ion beams

R. A. Barker, T. M. Mayer, Randolph H. Burton · Applied Physics Letters · 1982 · 52 citations

, , +14

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