Konstantin Karavaev

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Active since

2008

Affiliations

Brandenburg University of Technology Cottbus-Senftenberg(Current)

Konstantin Karavaev is an author at Brandenburg University of Technology Cottbus-Senftenberg specializing in surface physics, natural sciences, and atomic layer deposition.

Publications per year

2008–2009

Publications

The initial atomic layer deposition of HfO2∕Si(001) as followed <i>in situ</i> by synchrotron radiation photoelectron spectroscopy

Massimo Tallarida, Konstantin Karavaev, Dieter Schmeißer · Journal of Applied Physics · 2008 · 29 citations

Natural Sciences, Materials Engineering, Materials Science +17

Hf O 2 ∕ Si interface formation in atomic layer deposition films: An <i>in situ</i> investigation

Massimo Tallarida, Konstantin Karavaev, Dieter Schmeißer · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 15 citations

Natural Sciences, Materials Engineering, Materials Science +17

In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope

Krzysztof Kolanek, Massimo Tallarida, Konstantin Karavaev et al. · Thin Solid Films · 2009 · 14 citations

Natural Sciences, Materials Engineering, Materials Science +12

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