A. Harrus

Advantages of dual frequency PECVD for deposition of ILD and passivation films

Evert P. van de Ven, I.-W. Connick, A. Harrus · 2002 · 40 citations

Natural Sciences, Materials Engineering, Materials Science +17

Boron contamination of surfaces in silicon microelectronics processing: Characterization and causes

F. A. Stevie, E.P. Martin, P. M. Kahora et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1991 · 35 citations

Natural Sciences, Materials Engineering, Materials Science +15

The Virtual Cook: Modeling Heat Transfer in the Kitchen

Harold J. McGee, Jack McInerney, A. Harrus · Physics Today · 1999 · 25 citations

Agriculture, Food Science, Nutrition +15

<i>L</i> III absorption, resistivity, and susceptibility studies of the Ce(Ni1−<i>x</i>Co<i>x</i>)2 and Y(Ni1−<i>x</i>Co<i>x</i>)2 systems

P. Scoboria, A. Harrus, B. Andraka et al. · Journal of Applied Physics · 1984 · 22 citations · Full text

Natural Sciences, Materials Science, Physics +13

<i>L</i> III absorption studies of the mixed valence systems Ce(Rh1−<i>x</i>Ru<i>x</i>)2 and Ce(Rh1−<i>y</i>Pt<i>y</i>)2

T. Mihalisin, A. Harrus, S. Raaen et al. · Journal of Applied Physics · 1984 · 21 citations

Natural Sciences, Chemistry, Materials Science +16