Statistics
Publications
2
Citations
28
H-Index
2
Active since
2002
Affiliations
Applied Materials (United States)(Current)
X. Chen is an author at Applied Materials (United States) specializing in mask design, electron beam physics, and optics.
Publications per year
2002–2004
2
2
Progress toward a raster multibeam lithography tool
S. T. Coyle, Bassam Shamoun, Mingzhu Yu et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 18 citations
Engineering, Manufacturing Engineering, Materials Science +15
Prototype raster multibeam lithography tool
S. T. Coyle, Douglas E. Holmgren, X. Chen et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 10 citations
Engineering, Electrical Engineering, Manufacturing Engineering +16
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