Yorinobu Kunimune

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Active since

2002

Affiliations

Institute for Materials Research, Tohoku University(Current)

NEC (Japan)

Tohoku University

Renesas Electronics (Japan)

Yorinobu Kunimune is an author at Institute for Materials Research, Tohoku University specializing in materials science, semiconductor devices, and natural sciences.

Publications per year

2002–2016

Publications

Phosphorus and boron diffusion paths in polycrystalline silicon gate of a trench-type three-dimensional metal-oxide-semiconductor field effect transistor investigated by atom probe tomography

Bin Han, Hisashi Takamizawa, Yasuo Shimizu et al. · Applied Physics Letters · 2015 · 25 citations

Engineering, Electrical Engineering, Materials Science +17

A 100 nm node CMOS technology for practical SOC application requirement

A. Ono, K. Fukasaku, Tadayoshi Hirai et al. · 2002 · 20 citations

Engineering, Computer Engineering, Electrical Engineering +14

Quantitative analysis of hydrogen in SiO2/SiN/SiO2 stacks using atom probe tomography

Yorinobu Kunimune, Yasuhiro Shimada, Yusuke Sakurai et al. · AIP Advances · 2016 · 16 citations · Full text

Natural Sciences, Materials Science, Physics +8

Stress relaxation in dual-damascene Cu interconnects to suppress stress-induced voiding

M. Kawano, T. Fukase, Yutaka Yamamoto et al. · 2004 · 15 citations

Natural Sciences, Materials Engineering, Materials Science +17

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