Applied Physics Express · 2025 · 20 citations · 25 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesSemiconductor MaterialsHigh-frequency Semiconductor DevicesSemiconductor Device MaterialsSemiconductor PhysicsWide Band Gap SemiconductorsWide-bandgap Semiconductor DevicesWide-bandgap SemiconductorsCutoff FrequencyDevice FabricationGallium NitrideGallium Nitride (Gan) MaterialsGan-based High-frequency DevicesHigh-electron-mobility TransistorsHigh-frequency ElectronicsOhmic Contacts
Abstract Aluminum Scandium Nitride (AlScN) is an attractive material for use as a lattice-matched epitaxial barrier layer in GaN high-electron mobility transistors (HEMTs). Here we report the device fabrication, direct current (DC) and radio frequency (RF) characteristics of epitaxial AlScN/AlN/GaN HEMTs on SiC substrates with regrown ohmic contacts. These devices show record high on-current of over 4 A/mm, high cutoff frequency ( f T ) of 92.4 GHz and maximum oscillation frequency ( <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:msub> <mml:mrow> <mml:mi>f</mml:mi> </mml:mrow> <mml:mrow> <mml:mi mathvariant="normal">MAX</mml:mi> </mml:mrow> </mml:msub> </mml:math> ) of 134.3 GHz.
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GaN-based power devices: Physics, reliability, and perspectives
Matteo Meneghini, Carlo De Santi, Idriss Abid et al. · Journal of Applied Physics · 2021 · 628 citations · Full text
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