Concepedia

Surface roughness evolution law in full-aperture chemical mechanical polishing

Wumao Peng, Liang Jiang, Chaopeng Huang, Yu Chen, Yiming Tian, Yanjun Han, Shaohua Zhang, Linmao Qian

International Journal of Mechanical Sciences · 2024 · 23 citations · 81 references

DOI

Concepts

References

81

Roughness parameters

E S Gadelmawla, M M Koura, T.M.A. Maksoud et al. · Journal of Materials Processing Technology · 2002 · 1.9K citations

Material removal mechanism in chemical mechanical polishing: theory and modeling

Jianfeng Luo, David Dornfeld · IEEE Transactions on Semiconductor Manufacturing · 2001 · 641 citations

, , +16

Environment friendly chemical mechanical polishing of copper

Zhenyu Zhang, Junfeng Cui, Jiabo Zhang et al. · Applied Surface Science · 2018 · 306 citations

, , +8

A micro-contact and wear model for chemical–mechanical polishing of silicon wafers

Yongwu Zhao, L. Chang · Wear · 2002 · 301 citations

, , +16

On Competing Failure Modes in Rolling Contact

T. E. Tallian · A S L E Transactions · 1967 · 286 citations

, , +17