Wafer‐Scale Manufacturing of Near‐Infrared Metalenses

Abstract

Abstract Metalenses have revolutionized optical technologies with their superior ability to manipulate light and the potential to replace conventional, bulky optical components. However, their commercialization is hindered by limitations in conventional manufacturing techniques, such as small patterning areas, low throughput, and high cost. In this study, two methods are introduced for scalable and wafer‐scale manufacturing of metalenses operating in the near‐infrared region, aimed at overcoming the abovementioned challenges. The first type of metalens is polarization‐independent and constructed using hydrogenated amorphous silicon cylindrical structures fabricated through direct photolithography. This metalens has a diameter of 1 cm and numerical aperture (NA) of 0.53. The focusing efficiency is confirmed at a 940 nm wavelength, and the focal spot profile approaches the diffraction limit. The second metalens is polarization‐dependent and fabricated using silicon nanoparticle‐embedded‐resin rectangular structures through a cost‐effective nanoimprinting method. This process can produce metalenses with a diameter of 5 mm and an NA of 0.53. Both types of metalenses demonstrate high‐resolution capabilities when imaging a 1951 USAF resolution test target and bioimaging. This research offers innovative pathways for the mass production and large‐scale fabrication of metalenses. It is believed that the work will accelerate the industrialization of metalenses, fostering further advances in optical technology.