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Evaluation of Off-State Current Characteristics of Transistor Using Oxide Semiconductor Material, Indium–Gallium–Zinc Oxide
96
Citations
17
References
2012
Year
EngineeringOff-state Current CharacteristicsEmerging Memory TechnologySemiconductor DeviceSemiconductorsElectronic DevicesMemory DeviceMemory DevicesSemiconductor TechnologyElectrical EngineeringLong TimeOxide ElectronicsElectronic MemoryOxide SemiconductorsGallium OxideMicroelectronicsApplied PhysicsMetal Oxide SemiconductorSemiconductor MemoryIndium–gallium–zinc OxideMeasurement Method
We measured a significantly low off-state current (135 yA/µm at 85 °C) of a metal oxide semiconductor (MOS) transistor using indium–gallium–zinc oxide (IGZO), which is an oxide semiconductor material. Note that "y" is 10-24. A transistor in which the hydrogen concentration in an IGZO film is lowered (5×1019 cm-3 or lower) was used. To estimate the minute current accurately, we established a measurement method in which changes in the amount of electrical charge are measured for a long time. Such extremely low off-state current characteristics show promise for new applications of IGZO transistors in memories.
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