Impact of pattern dependency of SiGe layers grown selectively in source/drain on the performance of 22nm node pMOSFETs - Concepedia

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Impact of pattern dependency of SiGe layers grown selectively in source/drain on the performance of 22nm node pMOSFETs

13

Citations

8

References

2015

Year

Guilei Wang, M. Moeen, A. Abedin, Yefeng Xu, Jun Luo, Yiluan Guo, Changliang Qin, Zhaoyun Tang, Haizhou Yin, Junfeng Li,

Solid-State Electronics

Node PmosfetsElectrical EngineeringSige LayersEngineeringNanoelectronicsBias Temperature InstabilityApplied PhysicsSemiconductor Device FabricationPattern DependencySilicon On InsulatorMicroelectronicsSemiconductor Device

References

	Year	Citations

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