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Inhibitor-free area-selective atomic layer deposition of SiO2 through chemoselective adsorption of an aminodisilane precursor on oxide versus nitride substrates

Materials ScienceMolecular SieveChemical EngineeringEngineeringSurface ChemistryNanotechnologyNanomaterialsSurface ScienceAminodisilane PrecursorChemisorptionCatalysisChemoselective AdsorptionChemistryChemical DepositionChemical Vapor Deposition