Low-temperature growth of MoS2 on polymer and thin glass substrates for flexible electronics

Anh Tuấn Hoàng, Luhing Hu, B. Kim, +12

Nature Nanotechnology

Materials ScienceEngineeringFlexible ElectronicsLow-temperature GrowthOxide Electronics +4

Atomic Layer Deposition of an Indium Gallium Oxide Thin Film for Thin-Film Transistor Applications

Jiazhen Sheng, Eun Jung Park, Bonggeun Shong, +1

ACS Applied Materials & Interfaces

Area-Selective Atomic Layer Deposition Using Si Precursors as Inhibitors

Rizwan Khan, Bonggeun Shong, Byeong Guk Ko, +2

Chemistry of Materials

Materials ScienceChemical EngineeringSurface NanoengineeringEngineeringShort-chain Aminosilanes +11

Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al₂O₃ Using Ethanethiol Inhibitor

Hyun Gu Kim, Miso Kim, Bonwook Gu, +12

Chemistry of Materials

Materials ScienceChemical EngineeringEngineeringSurface ChemistryNanotechnology +13

Finite-Size Effects in O and CO Adsorption for the Late Transition Metals

Andrew A. Peterson, Lars C. Grabow, Thomas P. Brennan, +9

Topics in Catalysis

Materials ScienceEngineeringCo AdsorptionSurface ScienceCondensed Matter Physics +8

Low-Temperature Glycolysis of Polyethylene Terephthalate

Ngan Hong Le, Tran Thi Ngoc Van, Bonggeun Shong, +1

ACS Sustainable Chemistry & Engineering

EngineeringOrganic ChemistryCatalytic GlycolysisChemistryChemical Engineering +14

Low temperature atomic layer deposition of SiO2 thin films using di-isopropylaminosilane and ozone

Young-Soo Lee, Dongwon Choi, Bonggeun Shong, +2

Ceramics International

Materials ScienceEngineeringSilicon On InsulatorSurface ScienceApplied Physics +5

Highly conductive and flexible fiber for textile electronics obtained by extremely low-temperature atomic layer deposition of Pt

Jaehong Lee, Jaehong Yoon, Hyun Gu Kim, +8

NPG Asia Materials

Smart TextileEngineeringTextile ElectronicsTechnical TextilePressure Sensors +18

Inherently Area‐Selective Atomic Layer Deposition of SiO₂ Thin Films to Confer Oxide Versus Nitride Selectivity

Jinseon Lee, Jeong‐Min Lee, Hongjun Oh, +6

Advanced Functional Materials

EngineeringThin Film Process TechnologyChemistryChemical DepositionAdsorption Selectivity +15

Atomic Layer Deposition of Ru for Replacing Cu-Interconnects

Yohei Kotsugi, Seung‐Min Han, Youn‐Hye Kim, +11

Chemistry of Materials

EngineeringThin Film Process TechnologyChemistryChemical DepositionInterconnect (Integrated Circuits) +16