ICP etching of GaN microstructures in a Cl2–Ar plasma with subnanometer-scale sidewall surface roughness - Concepedia

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ICP etching of GaN microstructures in a Cl2–Ar plasma with subnanometer-scale sidewall surface roughness

DOI Full Paper Access

16

Citations

30

References

2022

Year

Clint D. Frye, C. E. Reinhardt, Scott Donald, Lars F. Voss, S. E. Harrison

Materials Science in Semiconductor Processing

Materials ScienceEngineeringSurface ScienceApplied PhysicsGan Power DeviceIcp EtchingCl2–ar PlasmaPlasma EtchingPlasma ProcessingGan Microstructures

References

	Year	Citations

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