The Journal of Physical Chemistry Letters · 2010 · 154 citations · 21 references
Natural SciencesMaterials EngineeringMaterials ScienceCondensed Matter PhysicsElectronic MaterialsSemiconductor MaterialsDefects In Electronic MaterialsElectrode MaterialsMetal OxidesOxide SemiconductorsSemiconductor DefectsSurface PhysicsCrystal Defects In OxidesDefect ComplexesFirst-principles ModelingIntrinsic DefectsOxide Defect StatesOxygen VacanciesOxygen Vacancies In Metal OxidesP-type Oxide Semiconductors
Cuprous oxide is widely known to be a native p -type semiconductor. Despite this, reports of electrodeposited films of n -type Cu 2 O continue to appear in the literature, with oxygen vacancies commonly implicated as the electron-donating defect. Through first-principles calculations, we demonstrate conclusively that intrinsic n -type defects or defect complexes in Cu 2 O cannot be the source of any n -type behavior displayed by electrodeposited samples. In light of these results, we discuss the experimental findings.
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